与时间相关的模型

与时间相关的分布模型

08 — 分类 · § 9.4 · ISO 22514-2

与时间相关的分布模型

按位置和变异是恒定、随机变化、系统性变化还是两者兼有,共八个模型。给过程指定模型涉及能力的任何判断:它不引用公差。只有 A1 和 A2 处于统计受控。

A1

In control
Location
Constant
Variation
Constant
Instantaneous
Normal
Resulting
Normal
Measured length of a part in a process in statistical control.

A2

In control
Location
Constant
Variation
Constant
Instantaneous
Non-normal, unimodal
Resulting
Non-normal, unimodal
Surface roughness: physically bounded characteristic.

B

Not in control
Location
Constant
Variation
Systematic or random
Instantaneous
Normal
Resulting
Non-normal, unimodal
Uneven spindle wear in a multi-spindle automatic with identical centering.

C1

Not in control
Location
Random (normal)
Variation
Constant
Instantaneous
Normal
Resulting
Normal
Different centering of clamping fixtures.

C2

Not in control
Location
Random (non-normal, unimodal)
Variation
Constant
Instantaneous
Normal
Resulting
Non-normal, unimodal
Fixed tools.

C3

Not in control
Location
Function-oriented
Variation
Constant
Instantaneous
Any shape
Resulting
Any shape
Wear trend, with cycle.

C4

Not in control
Location
Systematic and random
Variation
Constant
Instantaneous
Any shape
Resulting
Any shape
Tool changes or batch changes.

D

Not in control
Location
Systematic and random
Variation
Systematic and random
Instantaneous
Any shape
Resulting
Any shape
Multi-stream processes.

对控制计划的实务后果

按模型给出的选图、样本量和频次示例。表 10-2 · § 10.4。

ModelAnalysis chartSPC chartSample sizeFrequencyRationale
A1ShewhartShewhartSmallerLowerNear-stable process, normal.
A2PearsonPearsonSmallerLowerNear-stable, non-normal.
BPearsonShewhartLargerLowerNon-constant variation: difficult to readjust; compensated with larger sample.
CExtended ShewhartAcceptanceSmallerHigherConstant variation and variable position: easily corrected on machine, not in moulds.
DExtended ShewhartAcceptanceLargerHigherNeither position nor variation constant: larger sample and higher frequency.
Table 10-2 · § 10.4. Concrete numbers are calculated with chapter 10 methods; the four groups can be read as four risk levels.
可交互 改变子组划分策略,观察后果

实验:一张图上看四个型腔

车间里的实际过程:想象一副四腔注塑模或冲压模。每一次冲压或机器循环同时产出 4 件零件(每个型腔一件:1、2、3、4)。它们共享同一个机器循环(同样的压力、温度和材料批次),短期随机波动也相近。但由于工装的几何差异、磨损或冷却不均,每个型腔有各自的均值中心:型腔之间存在系统性偏移

合理子组的核心一课:两种情况下物理过程和产出的零件完全相同,产出的总散布(stotal 和 Ppk)也不变。随抽样策略剧烈变化的,是每一份变异在哪里显现出来:是被吸收进子组内部(子组内变异),还是被子组之间显现出来(子组间变异)。

与 § 9.4 模型的对应关系:这个过程对应 C4 模型(各流之间位置系统性变化,短期变异恒定)。糟糕的子组划分 —— 比如把型腔混进同一个子组 —— 并不能把过程变成稳定的 A1 模型;它只是把型腔偏移稀释进 σ̂组内,从而在 x̄ 图上制造出稳定的假象,把特殊原因藏起来而不是暴露出来。

Batch #42
subgroups of 4 cavities from the same shot (24 subgroups, n = 4) 零件完全相同;变的只是子组的划分方式(N = 96,24 次冲压 × 4 个型腔)。

按策略分组的 x̄ 图

N = 96 parts (24 shots × 4 cavities) · Batch #42
20.126820.111720.096620.081520.0664UCL 20.1202CL 20.0966LCL 20.07301471013161922x̄ · n = 4

按策略分组的 s 图

 
0.04070.02970.01870.0077-0.0032UCL 0.0359CL 0.0145LCL 0.00161471013161922s · exact limits via χ²
σ̂ 组内0.0157
总体 s0.0145
Cwk(诊断用)1.20
Ppk(总体)1.30
Stratification by mixing in the same shot (false illusion of control). Each subgroup contains all 4 cavities from the same machine cycle: the systematic offset between cavities is trapped inside each subgroup and artificially inflates σ̂ within. Because every subgroup carries the exact same compensated mix of cavities, subgroup means x̄ barely fluctuate and the chart yields no out-of-control C1 signals: it appears in control, but this is an artifact of sampling. With σ̂ within artificially inflated by mixing cavity offsets within subgroups, Cwk can approach or even fall below Ppk, and the chart completely conceals between-cavity differences.
Control-chart signal diagnosis: C1 (outside ±3σ limits / s limits): 0 · Sequence patterns (C2–C5): 0.

C1 signals are independent of display order and comparable across strategies. Sequence patterns (C2–C5) depend on sampling order and must not be interpreted as an intrinsic subgroup quality metric.

内容整理与技术支持 苏州工业园区东方大易管理咨询有限公司(东方大易 / 大易培训中心)

成立于 2006 年,专注汽车及制造业质量管理培训与咨询,开设 IATF 16949、VDA 6.3 过程审核内审员,以及核心工具 APQP · FMEA · CP · MSA · SPC · PPAP 等公开课与企业内训。本系列基于 AIAG-VDA《统计过程控制(SPC)手册》2026 年 7 月最终版与 ISO 22514 系列重新编排,示例数据均为虚构,仅用于演示计算。

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